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Amorphous Carbon Test Wafers
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- 200mm and 300mm diameter
- Blanket Film or Patterned Silicon Wafer
- Flexible Solutions – We can provide custom amorphous carbon test wafers for your unique requirements.
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Standard Amorphous Carbon Film Stacks
- Amorphous Carbon Hard Mask for Logic Devices
– Silicon + 2,000Å PE-CVD TEOS + 1,500Å aC + 300Å SiON ARL (Anti-reflective Layer)
- Amorphous Carbon Hard Mask for Memory Devices
– Silicon + 550Å Tungsten + 3,000Å PE-CVD SiN + 2,000Å aC + 600A SiON ARL
- Unpatterned Amorphous Carbon Film for Blanket Wafer Testing
– Silicon + 1,000Å Thermal Oxide + 1,500Å aC
– Silicon + 1,000Å Thermal Oxide + 2,000Å aC
– Silicon + 5,000Å aC
- Range of Thicknesses Available
– Standard thickness is 2,000Å
– Available in thicknesses from 0 - 5,000Å
- Choice of Silicon Substrate
– Photolithography Grade Silicon
– Premium Test Monitor Wafer
– High Quality Mechanical Grade Silicon
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Patterning Capability for Amorphous Carbon Hard Masks
- Patterning at 45nm node
– Line and Space pattern targeting 65nm lines at dense and isolated pitch
– Trenches, targeting 80nm features at dense and isolated pitch
– Contacts, targeting 100nm features at dense and isolated pitch
- Patterning at 65nm node
– Line and Space pattern targeting 80nm lines at dense and isolated pitch
– Trenches, targeting 100nm features at dense and isolated pitch
– Contacts, targeting 110nm features at dense and isolated pitch
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Check with us for Amorphous Carbon Test Wafers!
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